M.A. Volosova, A.S. Metel, Yu.A. Melnik
To improve adhesion of magnetron sputtered coatings on dielectric substrates they are bombarded by pulsed beams of gas atoms with energy up to 25 keV. The atoms are produced due to charge exchange collisions of ions accelerated from the magnetron discharge plasma by highvoltage pulses applied to a grid parallel to the magnetron target.
Keywords: magnetron deposition, dielectric substrates, coating synthesis, highenergy gas atoms, adhesion.