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ISSN 2072-3172

№3(30), 2014. TECHNOLOGIES AND EQUIPMENT FOR MACHINE-BUILDING INDUSTRY

V.P. Bolbukov

Energy regulation of fast gas atoms by means of changing resistance of a resistor between the process chamber and the emissive grid of the source

A  study  has  been  carried  out  the  dependence  of  fast  argon  atoms  energy,  the  atoms  assisting  deposition  of  metal atoms  on  a  substrate,  on  resistance  of  a  resistor  between  the  process  chamber  and  the  emissive  grid  of  the  metal  and argon  atoms  source,  on  voltage  between  the  source  anode  and  the  grid  as  well  as  on  voltage  between  the  anode  and  a target  being  sputtered  inside  the  source. 

 

 

Keywords: glow discharge, target, sputtering, metal atoms, deposition, fast argon atoms..

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